脉冲激光沉积（PLD）法制备NiZn铁氧体多晶薄膜研究-材料物理与化学专业毕业论文.docxVIP

一脉冲激光沉积(PLD)法制各NiZn铁氧体多晶薄膜研究 一 脉冲激光沉积(PLD)法制各NiZn铁氧体多晶薄膜研究 、互59073褂晏 摘 要 本文采用脉冲激光沉积(PLD)技术分别在硅(100)、玻璃基片上沉积了NiZn铁 氧体薄膜，研究了成膜机制和制备高性能NiZn铁氧体薄膜的条件，并分析了薄膜的 微观结构、磁性能与沉积过程的关系。通过SEM、XRD、VSM等分析表明：薄膜的 主晶相为尖晶石结构，不同基片上薄膜晶粒尺寸均随基片温度升高而增大，但硅基片 上薄膜在(400)晶面具有一定的择优取向；薄膜的沉积速率随基片温度升高呈现先增 大后下降的趋势，且在玻璃基片上沉积速率随基片温度的变化更为敏感；随着氧压的 升高，虽沉积速率逐渐下降，但其磁性能逐步变优；热处理可改善薄膜的磁性能，尤 其对较低温度下制备的样品，热处理的作用十分明显；提高基片温度、氧压和热处理 对薄膜磁性能的改善有明显作用；外加偏磁场有助于提高室温下制备的薄膜的磁性 能。 关键词：脉冲激光沉积PLDj：Nizn铁氧体；薄膜；微观结构旬磁性能 。j 1 学生姓名 奚小网 指导教师 陈亚杰 2002、5 脉冲激光沉积(PLD)法制备NiZn铁氧体多晶薄膜研究 脉冲激光沉积(PLD)法制备NiZn铁氧体多晶薄膜研究 摘要 ABSTRACT In this paper I deposited the NiZn ferrite films in different technological condition by the PLD technique，and studied the microstmctural and magnetic properties of films，and given the conditions that high quality films were deposited．The SEM，XRD and VSM revealed that the main crystalline phase of films is spinel structure．With increasing of substrate temperature，crystalline grain size increases．The films on Si substrate were[400】 orientation；the deposited rate of films increased with increasing of substrate temperature， and descends when substrate temperature was at higher temperature，the change of the films deposited rate on glass substrate is more sensitive with change of substrate temperature，the deposited rate of films on silicon substrate decreased under higher oxygen pressure．It is conclude higher substrate temperature and sufficient oxidation reaction Call obviously improve the magnetic properties of films．Heat treatment can improve magnetic properties．It has more remarkable influence on the magnetic properties of the films deposited at lower temperature．The magnet can betten the magnetic properties offilms at room temperature． Key words：pulsed laser deposited(PLD)，NiZn ferrite，the films，microstructural and magnetic properties． Xi xiao—wang Directed by Chen ya-jie 2002．5 U 脉冲激光沉积(PLD)法制各NiZn铁氧体多晶薄膜研究 脉冲激光沉积(PLD)法制各NiZn铁氧体多晶薄膜研究