热丝法低温制备多晶硅薄膜微结构的研究.pdfVIP

第36卷 第6期 人 工 晶 体 学 报 Vo1．36 No．6 2007年12月 JOURNAL OF SYNTHETIC CRYsTALS December．20O7 热丝法低温制备多晶硅薄膜微结构的研究 王丽春，张贵锋，侯晓多，姜 辛 (大连理工大学材料科学与工程学院三束材料改性国家重点实验室，大连I16024) 摘要：采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。利用XRD、拉曼光谱和原子力 显微镜(AFM)研究了灯丝与衬底间距(5～10ram)，灯丝温度(1800～1400C)和衬底温度(320—205℃)对薄膜晶 体取向、晶化率、晶粒尺寸以及形貌的影响规律。结果表明，随着热丝与衬底间距增加，多晶硅薄膜的晶化率和晶 粒尺寸明显减小；随热丝温度的降低，薄膜的晶化率都出现了大致相同的规律：先不断增大后突然大幅减小。 关键词：热丝化学气相沉积；多晶硅薄膜；择优取向；晶化率；晶体形貌 中图分类号：TB43 文献标识码：A 文章编号：iooo-985x(2007)06-1372-05 Microstructure of Poly-Si Thin Films Prepared by Hot-filament Chemical Vapor Deposition at Low·temperature WANG Li—chun，ZHANG Gui-feng，HOU Xiao—duo，JIANG Xin (State Key Laboratory of Materials Modification by Laser，Ion and Electron Beams，School of Materials Science and Engineering，Dalian University of Technology，Dalian 116024，China) (Received 9 aplr／／2007，accepted 8 June 2007) Abstract：Polycrystalline silicon thin films were prepared by hot—filament chemical vapor deposition (HFCVD)on glass at low—temperatures．The preferential growth orientation，the crystalline fraction and the grain sizes of poly—Si films significantly depend on the filament temperature and the distance of substrate to filament． The effects of deposition parameters on the microstructure of films were characterized by X—ray diffraction(XRD)，Raman spectrum and atomic force microscopy(AFM)．It Was found that the crystalline fraction and the grain sizes of poly—Si films distinctly decreased with the increasing distance of substrate to filament．The crystalline fraction of poly—Si films continuously increased to a maximum value and then