等离子体源阴极优化方法探讨与设计-光学工程专业论文.pdf.docxVIP

研究生优秀毕业论文 The The optimization method of Plasma source cathode is discussed and designed Abstr Discipline：Optical Engineering Signature：Supervisor Signature翱： 嚣 Student 7吲Ⅸf跏 Abstract Plasma．assisted deposition is major breakthrough in optical coating technology at home and abroad，the technology not only has the characteristics of energy—saving，do not environmental pollution，but also has more advantages in the large—scale manufacture of variety of high．quality optical thin film．Plasma technology is mainly used is mainly used for plasma deposition，it retains the advantages of the traditional techniques of high deposition rate and large area，and more importantly overcome the film structure loose and unstable performance deficiencies．It is expected to replace the optical thin films technology of new generation of traditional techniques．Foreign and domestic studies have shown that film structure of plasma-assisted deposition is dense and high mechanical strength，optical losses reached the best level of traditional technology．It is now widely used in the production of Germany Leybold APSpro，it makes the large-scale production of optical thin film quality is greatly improved．But the defect of the ion source is also obvious，LaB6 cathode material is expensive，and pollution is big．Therefore，we discuss the cathode discharge structure of plasma in this paper．By choosing different structure of hollow cathode，the design meet the needs of the industrial production and reduce the cost of the plasma source，also provide the reference for the same type of modification in the future research and production of ion of similar discharge principle． This paper is introduced according to the design of the plasma source and processes， mainly includes the following research contents： Firstly,the domestic and intemational development of the plasma source and plasma design meaning and purpose，and thus the working principle of the plasma source and application have full understanding．This pap