硅粉的冷等离子体刻蚀提纯研究-材料物理与化学专业论文.docxVIP

II II Abstract Because of the environmental problems and energy pressure caused by greenhouse effect, solar energy will become the chief energy in the future. The expensive costs of solar-silicon restrict the application of solar cell on the ground. The traditional polycrystalline silicon refining process has highly cost, the chemical product also made serious environmental pollution. Hence，it’s necessary to find a silicon material supply system independent on the semiconductor industry. In this thesis we make a series of research about the low-cost solar-silicon purification by the function of glow discharge plasma etching. This paper analyzes a model of plasma sheath and a model of silicon particulates movement in the plasma. Through calculated we can get the sheath thickness, current density, voltage on the cathode, pressure in chamber and particulates fall rate, that laid the sheath thickness and the etching time we need to finish process in once, this provide a theoretical foundation for the etching experiments. According to the theoretical account we took DC glow discharge plasma etching experiments, the impurity decreased significantly and the surface roughness also increased. The purity increased from 98.75％ to 99.56％. We found Ni element from the electrode plate will pollute the silicon powder this means the chamber needs to be improved further. In order to solve this problem, we improve the chamber and design RF vibration chamber. By theoretic analysis and a series of simulation experiments with laboratory equipment，the purity increased from 99.64％ to 99.96％, and eliminated the second pollution by Ni element. Compared the reaction result between DC and RF plasma etching, this equipment provide a new thought for the future development of this research. Keywords：cold plasma solar-silicon etching glow discharge sheath RF PAGE PAGE IV 目 录 摘 要 I HYPERLINK \l _bookmark0 Abstract II 1 绪 论 HYPERLINK \l _bookmark1 1.1 PV 原料简介 (2) HYPERLINK \