磁控溅射论文：磁控溅射与pecvd方法制备sige-sio2薄膜.pdfVIP

磁控溅射论文：磁控溅射与 PECVD 方法制备 SiGe-SiO_2 薄 膜 【中文摘要】近年来,随着太阳能技术的蓬勃发展,人们在日常生 活中太阳能电池应用的领域越来越广泛,而且目前应用最多的就是硅 电池。而如何增加太阳能电池板的光透过率,增加光电转换效率成为 目前研究的热门话题。二氧化硅具有结构简单,性能稳定,成本低廉, 而且很适合做光学增透膜。锗比硅的光谱吸收范围要宽,色散小,折射 率高而且在红外波段透过率也比较好。所以在太阳能硅电池板上镀上 这两种成份,能够有效地提高太阳能电池板的光透过率以及增加其光 电转换效率。本文主要研究了利用磁控溅射与等离子体增强化学气相 沉积方法制备 SiGe-SiO2 薄膜。对制备的工艺步骤进行了描述,对实 验的工艺进行了探索,对实验的结果进行了测试分析。本文首先介绍 了磁控溅射与等离子体增强化学气相沉积技术的发展状况,阐述了用 磁控溅射与等离子体增强化学气相沉积技术制备 SiGe-SiO2 薄膜的 基本原理,设备结构和基本的工艺流程,采用不同的实验参数进行了 薄膜沉积。对采用不同实验参数沉积得到的 SiGe-SiO2 光学增透薄膜 材料,用 X 射线荧光光谱仪 (EDX),傅里叶红外光谱仪 (FTIR)及俄歇电 子能谱 (AES)等方法对材料的相组成分,薄膜厚度以及薄膜的光透过 率等特征进行了研究。分析了本底真空,溅射气压,沉积时间,氧气和 压气流量等实验参数与材料特征之间的关系。 【英文摘要】Summary in recent years, with the development of solar technology, people in their daily life in the solar cell applications more and more widely, but most of the current application is the Silicon cells. And how to increase the solar panels light transmittance, increase the efficiency of the photovoltaic conversion into current research.Silica has a simple structure, stable performance, low cost, but also very suitable for optical anti-reflection coating. Ge absorption than silicon spectrum, the range is wide, refractive index high dispersion small and in the infrared band transmittance is relatively good. So Solar Silicon cell board plating on these two ingredients that can effectively increase the solar panels light transmittance as well as increase its photoelectric conversion efficiency.This article examines the use of magnetron sputtering and plasma enhanced chemical vapor deposition SiGe-SiO2 films. On the preparation of process steps are described, on the probing of the process, on the results of the analysis of the test.This article first introduces the magnetron sputtering and plasma enhanced chemical vapor deposition technology development, elaborated with magnetron sputtering and plasma enhanced chemical vapor deposition SiGe-SiO2 films fundamentals, device structures and the basic