电感耦合等离子体发射光谱法测定钕铁硼镀镍液中铁和铜.pdfVIP

No．19 群第19期 臼篡燃 V『oI-34 电感耦合等离子体发射光谱法测定钕铁硼镀镍液中铁和铜 邹龙1，刘荣丽1一，易师1，徐拓2 摘要：采用电感耦合等离子体发射光谱法(ICP．OES)对钕铁硼镀镍液中铁和铜的测定进行了研究，通过共存元素干扰试验确定了铁 和铜的测定谱线分别为259．940nm和327．395nm。基体干扰试验表明，镀镍液中的硫酸镍和硼酸若其浓度在工艺范围内，对待测 元素的背景干扰可忽略不计。该方法应用于钕铁硼镀镍液中铜和铁的分析，测定值与分别用铜试剂分光光度法测铜及5一溴水杨基 之间(相对标准偏差3．14％～5．04％)。此法简单可靠，满足科研与生产的快速检测需要。 关键词：钕铁硼；镀镍液；铁；铜；测定；电感耦合等离子体发射光谱 112—03 中图分类号：0657．3l 文献标志码：A 文章编号：1004—227X(2015)19—1 Determinationofironand innickel bathfor byinductivelycoupled copper plating neodymium-iron-boron Tuo emission Shi，XU optical spectrometry／／ZOULong，LIURong-li枣，YI plasma innickel bathusedforNd-Fe__Bwasstudied Abstract：ThedeterminationofFeandCu plating byinductivelycoupledplasma emission linedetermined theinterferenceof elementsis examining coexisting optical spectrometry(ICP·OES)．Thespectral by are 259．940nmforFeand327．395nmforC11．Theresultofmatrixinterference showedthatifNiS04andH3803 experiment within concentrationsinthe have effectonthedeterminationofFeandCu．Ⅵ／hen working platingbath，theynegligible being inthenickel bathforNd-Fe—B．theresultsobtainedthismethodare tothedeterminationofFeandCu applied plating by consistentwiththeCudeterminationresultsodium andtheFe by diethyldithiocarbamatespectrophotome