硅基薄膜太阳能电池材料的制备与性能研究-物理学、凝聚态物理专业论文.docxVIP

摘要 摘要 lIIIH MIll H ILIIII Y222331 7 非晶硅、多晶硅太阳能电池具有很高的性比价优势。本论文通过优化薄膜沉积的工 艺参数，用磁控溅射技术制备硅薄膜，以期能够得到高质量的器件级硅薄膜材料。磁控 溅射技术是一种简单、低温、快速的生长薄膜的方法，能够在不使用有毒气体和可燃性 气体的情况下进行掺杂和沉积薄膜，用掺杂靶材直接用溅射法沉积成膜，这一方法节能、 高效、环保。磁控溅射法与其它技术相比，它的最大优势在于薄膜的沉积速率快，成膜 效率和经济效益太阳能电池行业是近些年发展的极其火热的一个朝阳产业。在硅系太阳 能电池中，非常诱人，该技术有希望大幅度降低太阳能电池的成本。 随着第三代太阳能电池，即薄膜太阳能电池研究的不断深入，制备高质量的多晶硅 薄膜是提高多晶硅薄膜太阳能电池的光伏转换效率，这是从本质上解决问题的一个途 径。本论文对高质量的多晶硅薄膜的制备方面做了一些探索性的工作，采用金属铝诱导 的方法成功制备了质量较高的多晶硅薄膜。首先用射频磁控溅技术在玻璃衬底上沉积非 晶硅薄膜和铝薄膜，然后在心气氛中对样品进行退火处理，最后通过原子力显微镜和 x射线仪对退火前后的磁控溅射法制备的硅薄膜进行了分析。 关键词：多晶硅薄膜，磁控溅射，铝诱导晶化，退火 ABSTRACTThe ABSTRACT The solar cells is new industry in China，which developing very sharply in recent years．The higher performance price ratio of a-Si and poly—Si thin film solar cells in silicon based solar cells was verified through the development of this field．The silicon thin films have been prepared by magnetron sputtering method in order to get scientific datum needed in the process to deposit high quality device一1 evel films by optimizing the processing conditions．The magnetron sputtering is simple，fast film．The deposition method，which deposit doped silicon thin films without the usage of toxic flammable gases，instead， the polycrystalline as target to deposit films by Ar+sputtering．Compared to other film-deposition techniques，the magnetron sputtering is promising silicon thin film solar cells fabricating method for its high deposition rate and thus induced captivating economic efficiency．In the eyes of the author,this method is hopeful to reduce the cost of solar cells dramatically． With the further research into the third generation solar cells—min film solar cells．to fabricate high quality polycrystalline silicon(poly-Si)thin films is most straight approach to improve the photovoltaic conversion efficiency．In this thesis，the fabrication of high quality poly—Si thin films is investigated．In this dissertation，poly—Si thin films were successfully fabricated using aluminum induced crystallization(Ale) At the start．amorphous si