脉冲激光沉积过程中的一个新的综合模型.pdfVIP

Abstract Pulsed laser deposition is one of the most attractive new techniques, developed in the 1980‘s. Then, along with the multi-component oxide high-temperature superconductor discovered, PLD technique makes a great success in depositing such film materials. The PLD technique has so many advantages, such as high pulsed laser energy density, similarity between target and prepared thin film components, the high deposition rate, and lower substrate temperature. With the development of Pulsed laser technology, the pulse width of laser output arranges from nanosecond to femtosecond in the PLD process. The development trend of PLD is the ultra short and ultra high laser. Recently, our group has studies every aspect of the PLD process. The relevant physics mechanism research of the PLD technique has flourished. This paper studies the ablation mechanism of different pulse width and set up a unified model. It can describe the thermal conduction phenomenon in the high energy laser ablation process. Specially, it is still available when laser pulse width ranges from nanosecond to femtosecond timescale. We get the ablation thresholds by solving the unified model, which agree with the experimental data well. Firstly, we analysis the characters of laser －targets interaction: the laser –electron interaction, the electron-electron scattering, the electron-ion coupling. Then it is obvious that the thermal equilibrium ablation corresponds with long pulse laser and the non-equilibrium ablation corresponds with ultrashort pulse laser. Usually, we still adopt the traditional thermal conduction model for long pulse laser and the two temperature model(TTM) for ultrashort pulse laser. The ele