薄膜技术教学资料-04Thin-Film sputtering processes.pptVIP

A veryluminous small cathode spot(10~ 8 to 10~4m diameter) forms that passes extremely high current densities(~10 8 to10 12A/m2).This causes erosion of the cathode by melting and vaporization as well as ejection of solid and molten particles. * Initially, ion bombardment of the cathode is not uniform but concentrated near the cathode edges or at other surface irregularities. As more power is applied, the bombardment increasingly spreads over the entire surface until a nearly uniform current density is achieved. A further increase in power results in both higher voltage and cathode current-density levels. The abnormal discharge regime has now been entered and this is the operative domain for sputtering and other discharge processes such as plasma etching. 反常辉光放电：当电离度达到比较高以后，电流随功率增加变缓，但 电压迅速增加 * Initially, ion bombardment of the cathode is not uniform but concentrated near the cathode edges or at other surface irregularities. As more power is applied, the bombardment increasingly spreads over the entire surface until a nearly uniform current density is achieved. A further increase in power results in both higher voltage and cathode current-density levels. The abnormal discharge regime has now been entered and this is the operative domain for sputtering and other discharge processes such as plasma etching. 反常辉光放电：当电离度达到比较高以后，电流随功率增加变缓，但 电压迅速增加 * At still higher currents, the cathode gets hotter. Now thermionic emission of electrons exceeds that of secondary-electron emission and low-voltage arcs propagate. Arcs have been defined (Ref. 3) as gas or vapor discharges where the cathode voltage drop is of the order of the minimum ionizing or excitation potential. Furthermore, the arc is a self-sustained discharge that supports high currents by providing its own mechanism for electron emission from negative or positive electrodes. A number of commercial PVD processes rely on arcs. * immersion of a floating electrode into a pl