薄膜技术教学资料-05Thin-Film CVD.pptVIP

Epitaxy of Y2O3 thin film by CVD Use of YCl3： K = e30，react in forward direction， But driving force is large, polycrystal structure； Use of YBr3 has larger driving force than Use of YCl3 SELICTION OF REACTIVE ROUTE e.g.2 Epitaxy of Y2O3 thin film by CVD Using CO2 instead of O2？ Can not obtain Y2O3 thin film e.g.2 SELICTION OF REACTIVE ROUTE Epitaxy of Y2O3 thin film by CVD YBr3+CO2： This rout is more feasible e.g.2 SELICTION OF REACTIVE ROUTE Affordable cost of the equipment and operating expenses, the suitability for both batch and semicontinuous operation, and the compatibility with other processing steps. * * (epitaxial) Si substrate, polysilicon, various SiO2 films, low-temperature oxide (LTO), borophosphosilicate glass (BPSG), and W plugs * . * 1. Convective and diffusive transport of reactants from the gas inlets to the reaction zone 2. Chemical reactions in the gas phase to produce new reactive species and by-products 3. Transport of the initial reactants and their products to the substrate surface 4. Adsorption (chemical and physical) and diffusion of these species on the substrate surface 5. Heterogeneous reactions catalyzed by the surface leading to film formation 6. Desorption of the volatile by-products of surface reactions 7. Convective and diffusive transport of the reaction by-products away from the reaction zone * The eventual application here is the production of optical fiber for communications purposes. Rather than a thin film, the SiO2 forms a cottoncandy- like deposit consisting of soot particles less than 1000 A in size. These are then consolidated by elevated-temperature sintering to produce a fully dense silica rod for subsequent drawing into fiber. * mass transport between hot and cold ends * * . Other reactions occur far from thermodynamic equilibrium and are strongly driven toward decomposition and film deposition. * 化学热力学是物理化学和热力学的一个分支学科，它主要研究物质系统在各种条件下的物理和化学变化中所伴随着的能量变化，从而对化学反应的方向和进行的程度作出准确的判断。 化学动力学（chemical kine