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gan_si npn hbt特性研究 gan_si npn hbt characteristics of study
第36卷第1期 电子器件 V01.36No.1
Chinese ofElectronDevices
2013年2月 Journal Feb.2013
HBT
GaN_Si Characteristicsof
npn Study
DONG
Guoxiang,LIJianqing+
ElectronicScienceand
(InstitutePhysical of Technology 610054,China)
of Electronics,University ofChina,Chengdu
Abstract:删Si transistorcharacteristicssimulationwasstudied
heterojunctionbipolar using
devicesimulationsoftware.G8忒/Si transistortoestablishaseriesof accurate
heterojunctionbipolar reasonably
ionization narrows modelandthe model.
physicalmodels,includingincompletemodel,bandmodel,mobility composite
neresultsfrom showedthatintheGaN/Si turn-on is2.5
experiment hetero—junction,thevoltage eV.1b=0.2mA,the
100
current factoriS timesandthebreakdownis900V。whichmakethis
amplification voltage hetero-junctionbipolor
a
transistorobtain intheareaof devices.卟e cut—off is100
greatapplicationprospected high·power highest frequency
itcan RF
that workinthe andmicrowave bands.
GHz,SO frequency
Keywords:heterojunctiondevice;physicalmodel;simulation;GaN
EEACC:25砷Jdoi:10.3969/j.issn.1∞5—94如.2013.01.002
GaN—SiHBT特性研究
npn
董果香,李建清+
(电子科技大学物理电子学院,成都610054)
摘 要:采用二维器件仿真软件对GaN/Si异质结双极晶体管进行了特性仿真研究。对GaN/Si异质结双极晶体管建立了合
理准确的物理模型,包括不完全电离模型、能带模型、能带变窄模型、迁移率模型与复合模型。结果表明,GaN/Si异质结开启
电压为2
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