光刻机工件台与掩模台同步控制算法分析及实现-analysis and implementation of synchronous control algorithm for workpiece stage and mask stage of lithography machine.docxVIP

光刻机工件台与掩模台同步控制算法分析及实现-analysis and implementation of synchronous control algorithm for workpiece stage and mask stage of lithography machine.docx

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光刻机工件台与掩模台同步控制算法分析及实现-analysis and implementation of synchronous control algorithm for workpiece stage and mask stage of lithography machine

哈尔滨工业大学工程硕士学位论文AbstractStep Scan lithography Research and Development work has become one of the major science and technology. Originated from wafer stage and reticle stage of lithography control system, this paper discusses the designer of synchronization controller to satisfy the task schedule of exposure scanning, data transmission and the synchronization deviation of wafer stage and reticle stage.Firstly, this paper summaries and points out some important phases in the development of lithography technology, Highlights the progress of synchronization control of lithography.Secondly, by analyzing step-by-step scanning exposure progress of Step Scan lithography, this paper divides the subsystems which are related to exposure into host system and slave system, and divides the exposure process into five states depending on the task. The host system manages the tasks and controls the actions in slave systems through the conversion of internal state.This paper designs a mechanism for data and status flags by the characteristic of hardware connections and transmission of different data types. FIFO queue with a state timer is used to broadcast synchronization status and data through a synchronization control bus defined in VME bus.A synchronization control card is designed considering the requirement of the host synchronization control system. This paper tests the transmission between the lower computer and the synchronization control card, between the synchronization control card and the slave system.Finally, this paper designers a synchronization arithmetic based on repetitive control method which effectively reduces the synchronization deviation during the scan and exposure period, keeps the tracking accuracy and dynamic characters in the meanwhile. Simulation results show that the synchronization deviation can be reduced effectively.Keywords Step Scan lithography; synchronization control; synchronization control bus; repetitive control- II -哈尔滨工业大学工程硕士学位论文哈尔滨工业大学工

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