不同基底上透明导电薄膜的光学性质分析-光学工程专业论文.docxVIP

不同基底上透明导电薄膜的光学性质分析 不同基底上透明导电薄膜的光学性质分析 II II (2) 对于玻璃基底，因为玻璃本身为各向同性材料，但是玻璃表面没经过抛 光工艺处理，表面粗糙度较大。在不同的入射角度下，玻璃表面沉积透明导 电金膜前后的光学参数变化明显，而在不同入射方向上，沉积透明导电金薄 膜后也较沉积前有相应地变化。这结果一来可以进一步确定透明导电金膜的 光学性质，二来可以探究玻璃基底对透明导电金膜的光学性质的影响。 (3) 对于 PI 基底，因为 PI 膜是有机高分子材料，是典型的各向异性材料， 而且 PI 膜表面同样粗糙度较大。在不同入射角度和入射方向上的光学参数 均发生明显的变化。结果表明在 PI 膜上沉积透明导电金膜能够探究各向异 性基底对透明导电金膜的光学性质的影响。 关键词：透明导电金膜、直流溅射、椭圆偏振仪、光学性质 III III ANALYSIS OF THE OPTICAL PROPERTIES OF THE TRANSPARENT CONDUCTIVE FILM BASED ON DIFFERENT SUBSTRATES ABSTRACT In the field of photoelectric science and technology, the highly visible light transmittance (Tavg80%) and low resistivity (ρ10-3 Ω·cm) of transparent conductive thin-film materials are used in wide range, such as LCD, touch screen and solar cell etc. The optical properties of the transparent conductive thin film is largely depended on the material properties of the film’s substrate, and it is important to study the impact of the substrates on the optical properties of the transparent conductive film. Gold is selected as the transparent conductive material and deposited on different substrates by DC sputtering, because the performance of gold is chemically stable and often manifests optical isotropy and represents the dependence of film’s optical properties on substrate materials. The results of these study have a certain significance to the preparation of transparent conductive films, especially those claim some special optical requirements. The main content is as follows. Firstly, the DC sputtering method is used to prepare transparent conductive gold films on Silicon and glass and common flexible substrate PI film respectively. The variation of the thicknesses of transparent conductive gold films which were prepared on different sputtering conditions, is measured by ellipsometer, the square resistance is measured by four-point probe method, and the surface morphology is characterized by SEM. The results show that: the thickness of the transparent conductive gold film increase