精密PDMS微流控芯片简易制作方法改进.docVIP

  A method for a simpler and more convenient replica molding of high-performance PDMS chips# ZHANG Jinling1, YANG Pengyuan2, SUI Guodong1** 5 10 15 20 25 (1. Department of Environmental Science Engineering, Fudan University, Shanghai 200433; 2. Institute of Biomedical Science, Fudan University, ShangHai 200433) Abstract: We present a method of an improvement for the standard soft lithography fabrication process to generate highly reduplicate microfabricated patterns. This method improves the release of poly (dimethylsiloxane) (PDMS) devices from replica molds with high-density microstructures. During fabrication, only one extra step was added to prepare a single-spin coating of a thin layer of PDMS, compared with traditional microfabrication technique. It was validated with silicon wafers containing arrays of 50 μm deep SU8 microwells with various densities (a maximum density of 50000/cm2). Keywords: microfluidics; PDMS; soft lithography 0 Introduction Briefly introduce the background and object of the research in about 400~600 words, and do not exceed 800 words. In recent years, soft lithography[1] has become a widely used and mature fabrication technique for the rapid prototyping of microfluidic circuits because of its applications in biochemical analysis[2,3], chemical reactions[4] and cell-based micro assays.[5,6] This fabrication technique imposes restrictions on feature density, fluid handling complexity, and strict design constraints of channel routing. Assembling of the single and multilayer micro?uidic devices[7-10] as well as the formation of high-density microwell arrays[11-13] require reliable and efficient microscale manufacturing techniques. The soft lithography method involves the replica molding of a master containing lithographically-patterned photoresist structures and poly (dimethylsiloxane) (PDMS), which is the most widely used elastomeric material for microfluidic chip fabrication. [14-16] Casting PDMS elastomers onto molds, and the foll