Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography英文文献资料.docVIP

Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography英文文献资料.doc

  1. 1、原创力文档(book118)网站文档一经付费(服务费),不意味着购买了该文档的版权,仅供个人/单位学习、研究之用,不得用于商业用途,未经授权,严禁复制、发行、汇编、翻译或者网络传播等,侵权必究。。
  2. 2、本站所有内容均由合作方或网友上传,本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺!文档内容仅供研究参考,付费前请自行鉴别。如您付费,意味着您自己接受本站规则且自行承担风险,本站不退款、不进行额外附加服务;查看《如何避免下载的几个坑》。如果您已付费下载过本站文档,您可以点击 这里二次下载
  3. 3、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等,请点击“版权申诉”(推荐),也可以打举报电话:400-050-0827(电话支持时间:9:00-18:30)。
  4. 4、该文档为VIP文档,如果想要下载,成为VIP会员后,下载免费。
  5. 5、成为VIP后,下载本文档将扣除1次下载权益。下载后,不支持退款、换文档。如有疑问请联系我们
  6. 6、成为VIP后,您将拥有八大权益,权益包括:VIP文档下载权益、阅读免打扰、文档格式转换、高级专利检索、专属身份标志、高级客服、多端互通、版权登记。
  7. 7、VIP文档为合作方或网友上传,每下载1次, 网站将根据用户上传文档的质量评分、类型等,对文档贡献者给予高额补贴、流量扶持。如果你也想贡献VIP文档。上传文档
查看更多
Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography英文文献资料

Optics and Photonics Journal, 2012, 2, 13-16 /10.4236/opj.2012.21003 Published Online March 2012 (http://www.SciRP.org/journal/opj) Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography Xinping Zhang , Shengfei Feng, Tianrui Zhai * College of Applied Sciences, Beijing University of Technology, Beijing, China Email: zhangxinping@ * Received January 20, 2012; revised February 18, 2012; accepted February 27, 2012 ABSTRACT A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with polished side-walls to a single laser beam in the ultraviolet and requires small coherence length of the laser. No additional beam splitting scheme and no adjust- ments for laser-beam overlapping and for optical path-length balancing are needed. Bragg-angle diffractions are ob- served as strong optical extinction that is tunable with changing the angle of incidence. This device is important for the design of efficient filters, beam splitters, and photonic devices. Keywords: Slant Grating; Single-Beam Interference Lithography; Bragg-Angle Diffraction 1. Introduction portant for practical applications in high-contrast filters, beam splitters, and in the design of photonic crystal devices. Interference lithography [1,2] is a conventional technique for producing large-area one- and two-dimensional grat- ing structures in the micro- or nano-scale. In particular, this technique can be used to fabricate the master grat- ings for the construction of metallic photonic crystals [3], which are important for the development of new lasers,[4] polarizers [5], filters [6], and other photonic devices [7,8]. High flexibility in the interference-lithography scheme using different arrangements of the laser beams enables realization of a variety of photonic structures [9-11]. Con- v

您可能关注的文档

文档评论(0)

qianqiana + 关注
实名认证
文档贡献者

该用户很懒,什么也没介绍

版权声明书
用户编号:5132241303000003

1亿VIP精品文档

相关文档